Exposure method using reticle remount for temperature influence

Details Exposure method using reticle remount for temperature influence Exposure method using reticle remount for temperature influence

1998-03-16

2000-08-15

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430 22, G03F 900

Patent

active

061034339

ABSTRACT:
An exposure method includes holding a reticle fixed, holding a wafer fixed, irradiating the reticle with an exposure beam, projecting an image of the irradicated reticle onto the wafer through a projection optical system, and re-mounting the reticle as the temperature of the reticle reaches or exceeds a predetermined temperature.

REFERENCES:
patent: 5329126 (1994-07-01), Amemiya et al.
patent: 5680428 (1997-10-01), Amemiya et al.

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