Exposure method using reference marks on both the mask and the s

Details Exposure method using reference marks on both the mask and the s Exposure method using reference marks on both the mask and the s

1997-09-30

1998-08-11

Moses, R. L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 54, 355 77, 356401, H01L 2127, G03F 720, G03F 900

Patent

active

057934720

ABSTRACT:
Alignment between a mask and a photosensitive substrate is performed using a first reference mark formed on the mask and a second reference mark formed on the photosensitive substrate. After that, the mask and the photosensitive substrate are relatively moved, so that an image of one of a light-shielding pattern and a light-transmitting pattern formed at a position different from the first reference mark on the mask is formed on the second reference mark on the photosensitive substrate. Then, a circuit pattern formed on the mask is transferred onto the photosensitive substrate, and a partial region including the second reference mark is exposed with the image of one of the light-shielding pattern and the light-transmitting pattern.

REFERENCES:
patent: 4712016 (1987-12-01), Matsumura
patent: 5100237 (1992-03-01), Wittekoek et al.
patent: 5148214 (1992-09-01), Ohta et al.
patent: 5160957 (1992-11-01), Ina et al.
patent: 5231471 (1993-07-01), Torigoe
patent: 5262822 (1993-11-01), Kosugi et al.

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