Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1993-12-06
1995-05-02
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430311, 430312, 430314, G03F 900
Patent
active
054118239
ABSTRACT:
A phase shift reducing projection exposure method for making it easy to make the pattern data of a phase shift mask capable of improving the focal depth of a transfer exposure plane and the resolution of a pattern. The exposure method comprises: a first enlarging step of making the data of a primary transparent pattern by enlarging the width of repeating patterns to a predetermined extent under a process condition without changing the relative position coordinates of the repeating patterns when the pattern data on the phase shift mask are to be made; and a second enlarging step of making the data of an auxiliary transparent pattern by enlarging the width of the primary transparent pattern obtained in the data status by the first enlarging step to a predetermined extent on the basis of the characteristic conditions of a reducing projection exposure optical system, and subsequently by eliminating the data of the primary transparent pattern from the data of the enlarged primary transparent pattern.
REFERENCES:
patent: 5302477 (1994-04-01), Dao et al.
Hitachi , Ltd.
Rosasco S.
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