Exposure method for producing a hologram mask

Details Exposure method for producing a hologram mask Exposure method for producing a hologram mask

2006-02-07

2006-02-07

Angebranndt, Martin (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Holographic process, composition, or product

C430S002000, C359S022000, C359S024000

Reexamination Certificate

active

06994938

ABSTRACT:
Methods for producing a hologram mask approximating the exposure produced by a non-holographic phase shifting photo mask are disclosed. One such method exposes a hologram recording material to a first object light, having passed through a first original mask and a first reference light having a difference in phase with the first object light, and further exposing the hologram recording material to a second object light, having passed through a second original mask and a second reference light having a difference in phase with the second object light, wherein first and second phase differences are not the same and wherein the exposed hologram material can be replayed to produce an exposed pattern that approximates an exposed pattern of a non-holographic phase shifting photomask.

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