Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-04-18
2006-04-18
Letscher, Geraldine (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S312000
Reexamination Certificate
active
07029799
ABSTRACT:
There is provided a method which forms master masks used when a pattern of size larger than a region which can be exposed at one time is exposed on a to-be-exposed object. The pattern of the size larger than the region which can be exposed at one time is divided into a region of low repetitiveness and a region of high repetitiveness. A pattern of the region of low repetitiveness is drawn on at least one first master mask. Further, a pattern of the region of high repetitiveness is drawn on at least one second master mask.
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S. Kyoh et al; “Management Of Pattern Generation System Based on I-Line Stepper” International Society for Optical Engineering—20thAnnual BACUS Symposium On Photomask Technology, vol. 4186, 9 pages, (Sep. 20, 2000).
Inoue Soichi
Kyoh Suigen
Dai Nippon Printing Co. Ltd.
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Letscher Geraldine
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