Exposure method, exposure quantity calculating system using...

Details Exposure method, exposure quantity calculating system using... Exposure method, exposure quantity calculating system using...

2006-10-10

2006-10-10

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C430S394000

Reexamination Certificate

active

07118834

ABSTRACT:
An exposure method is disclosed, which comprises preparing a first mask in which a size of a mask pattern is measured in advance, calculating a first exposure quantity to be applied to the first mask to provide a first resist pattern by using the first mask, simulating optical intensity distributions on a wafer in a case where the first mask is used and an optical intensity distribution on the wafer in a case where a second mask is used, a size of a mask pattern of the second mask being measured in advance, calculating a difference in optical intensity between the first mask and the second mask from the simulated optical intensity distributions, and calculating a second exposure quantity to be applied to the second mask to provide a second resist pattern, from the first exposure quantity and the difference in optical intensity.

REFERENCES:
patent: 6249597 (2001-06-01), Tsudaka
patent: 6536032 (2003-03-01), Tanaka et al.
patent: 6586146 (2003-07-01), Chang et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 6-196378 (1994-07-01), None
patent: 3152776 (2001-01-01), None

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