Exposure method, exposure apparatus and its making method,...

Details Exposure method, exposure apparatus and its making method,... Exposure method, exposure apparatus and its making method,...

2005-02-01

2005-02-01

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

06850313

ABSTRACT:
The energy amount of the energy beam passing through the illumination optical system is detected with the first photosensor, whereas the energy amount of the energy beam EL passing through at least a portion of the projection optical system PL is detected. And in accordance with the detection results, the main controller controls the exposure amount provided on the substrate during exposure. In the case the transmittance of the energy beam in the optical path from the first photosensor to the substrate surface (image plane) changes, this change is substantially precisely reflected to a value obtained by dividing the detection value of the second photosensor by the detection value of the first photosensor and normalizing the result. Accordingly, the transmittance change of the optical system in the optical path can be substantially cancelled out, allowing an exposure amount control with high precision.

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