Exposure method and projection exposure apparatus using the same

Details Exposure method and projection exposure apparatus using the same Exposure method and projection exposure apparatus using the same

1994-11-03

1998-10-13

Moses, R. L.

Photocopying

Projection printing and copying cameras

Focus or magnification control

355 53, G03B 2742, G03B 2752

Patent

active

058220437

ABSTRACT:
An exposure method includes the steps of illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N.sub.op, and scanning the original and the substrate In the scan direction at a speed ratio N.sub.st different from the projection magnification N.sub.op wherein the speed ratio N.sub.st corresponds to the ratio between the speed of the substrate and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by .DELTA.l. a relation 0<.vertline.N.sub.op -N.sub.st .vertline..multidot.b<.DELTA.l is satisfied.

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Buckley, "Expanding the Horizons of Optical Projection Lithography," Solid State Technology, May 1982, pp. 77 through 82.

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