Exposure method and pattern data preparation system therefor, pa

Details Exposure method and pattern data preparation system therefor, pa Exposure method and pattern data preparation system therefor, pa

1996-05-10

1998-05-26

Fuller, Benjamin R.

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

B41J 2435

Patent

active

057574090

ABSTRACT:
Selective pattern exposure with high reliability is made possible by a desired pattern of repeated pattern and a non-repeated pattern. Exposure technology is obtained to enable improvement of preparation efficiency of pattern data and to secure inspection of an aperture pattern. With the invention, an electron beam is used as focused beam, and a pattern exposure apparatus of a batch transfer system for transferring repeated pattern and non-repeated pattern of plural graphics of a semiconductor integrated circuit or the like comprises an EB drawing section for controlling the beam and irradiating beam onto a sample, a control I/O section, a drawing control section and a data storage section. In the EB drawing section, a semiconductor wafer is mounted on a platform, and in the path of the electron beam from the electron beam source to the stage, a first mask, a blanking electrode, an electron lens, a first deflector, a second deflector, a second mask and a third deflector are installed.

REFERENCES:
patent: 4213053 (1980-07-01), Pfeiffer
patent: 4585943 (1986-04-01), Yasuda et al.
patent: 4586141 (1986-04-01), Yasuda et al.
patent: 5036209 (1991-07-01), Kataoka et al.
patent: 5051556 (1991-09-01), Sakamoto et al.
patent: 5557314 (1996-09-01), Okamoto et al.
Semiconductor World, Jul. 1990, pp. 170-175, Jun. 20, 1989 by Press Journal Co., Ltd.
SPIE vol. 632 Electron-Beam, X-Ray, & Ion-Beam Technique For Submicrometer Lithographies V (1986) pp. 85-92.
Hitachi Review vol. 40 (1991), No. 6, Development and Application of Electron Beam Lithography Systems.

Affiliated with

Also associated with

Rating

Exposure method and pattern data preparation system therefor, pa does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method and pattern data preparation system therefor, pa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method and pattern data preparation system therefor, pa will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1967919