Exposure method, and method of making exposure apparatus having

Details Exposure method, and method of making exposure apparatus having Exposure method, and method of making exposure apparatus having

1999-05-25

2000-07-11

Ro, Bentsu

Electricity: motive power systems

Positional servo systems

With particular 'error-detecting' means

74471WY, 248638, H01L 21027

Patent

active

060877979

ABSTRACT:
A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine. This isolation is accomplished by providing a mechanical support for the stage independent of the support for its window frame guide. The window frame guide is a hinged structure capable of a slight yawing (rotational) motion due to hinged flexures which connect the window frame guide members.

REFERENCES:
patent: Re27289 (1972-02-01), Sawyer
patent: Re27436 (1972-07-01), Sawyer
patent: 3789285 (1974-01-01), Nishizawa
patent: 3889164 (1975-06-01), Nishizawa et al.
patent: 3935486 (1976-01-01), Nagashima
patent: 4019109 (1977-04-01), McCoy et al.
patent: 4087729 (1978-05-01), Yamazaki et al.
patent: 4129291 (1978-12-01), Kato et al.
patent: 4234175 (1980-11-01), Sato et al.
patent: 4392642 (1983-07-01), Chitayat
patent: 4409860 (1983-10-01), Moriyama et al.
patent: 4425508 (1984-01-01), Lewis, Jr. et al.
patent: 4443743 (1984-04-01), Forys et al.
patent: 4485339 (1984-11-01), Trost
patent: 4492356 (1985-01-01), Taniguchi et al.
patent: 4504144 (1985-03-01), Trost
patent: 4506204 (1985-03-01), Galburt
patent: 4506205 (1985-03-01), Trost et al.
patent: 4507597 (1985-03-01), Trost
patent: 4514858 (1985-04-01), Novak
patent: 4516253 (1985-05-01), Novak
patent: 4525659 (1985-06-01), Imahashi et al.
patent: 4575942 (1986-03-01), Moriyama
patent: 4615515 (1986-10-01), Suzuta et al.
patent: 4628238 (1986-12-01), Smulders et al.
patent: 4630942 (1986-12-01), Tsumaki et al.
patent: 4641071 (1987-02-01), Tazawa et al.
patent: 4648723 (1987-03-01), Sugiyama et al.
patent: 4648724 (1987-03-01), Sugiyama et al.
patent: 4653408 (1987-03-01), Nagashima et al.
patent: 4654571 (1987-03-01), Hinds
patent: 4667139 (1987-05-01), Hirai et al.
patent: 4675891 (1987-06-01), Plessis et al.
patent: 4677651 (1987-06-01), Hartl et al.
patent: 4684315 (1987-08-01), Sugishima et al.
patent: 4687980 (1987-08-01), Phillips et al.
patent: 4698575 (1987-10-01), Bouwer
patent: 4708465 (1987-11-01), Isohata et al.
patent: 4723086 (1988-02-01), Leibovich et al.
patent: 4742286 (1988-05-01), Phillips
patent: 4744675 (1988-05-01), Sakino et al.
patent: 4750721 (1988-06-01), Sasada
patent: 4770531 (1988-09-01), Tanaka et al.
patent: 4803712 (1989-02-01), Kembo et al.
patent: 4812725 (1989-03-01), Chitayat
patent: 4817930 (1989-04-01), Van Deuren
patent: 4818169 (1989-04-01), Schram et al.
patent: 4870668 (1989-09-01), Frankel et al.
patent: 4887804 (1989-12-01), Ohtsuka
patent: 4916340 (1990-04-01), Negishi
patent: 4948330 (1990-08-01), Nomura et al.
patent: 4952858 (1990-08-01), Galburt
patent: 4993696 (1991-02-01), Furukawa et al.
patent: 5022619 (1991-06-01), Mamada
patent: 5040431 (1991-08-01), Sakino et al.
patent: 5059090 (1991-10-01), Bobroff et al.
patent: 5120034 (1992-06-01), Van Engelen et al.
patent: 5150153 (1992-09-01), Franken et al.
patent: 5228358 (1993-07-01), Sakino et al.
patent: 5241183 (1993-08-01), Kanai et al.
patent: 5243491 (1993-09-01), Van Eijk et al.
patent: 5260580 (1993-11-01), Itoh et al.
patent: 5280677 (1994-01-01), Kubo et al.
patent: 5285142 (1994-02-01), Galburt et al.
patent: 5327060 (1994-07-01), Van Engelen et al.
patent: 5874820 (1999-02-01), Lee
Moriyama, et al., "Precision X-Y Stage with a Piezo-driven Fine-table," The Bulletin of The Japan Society Precision Engineering, vol. 22, No. 1, pp. 13-17, Mar. 1988.

Affiliated with

Also associated with

Rating

Exposure method, and method of making exposure apparatus having does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method, and method of making exposure apparatus having , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method, and method of making exposure apparatus having will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-545252