Exposure method and exposure system

Details Exposure method and exposure system Exposure method and exposure system

2007-08-07

2007-08-07

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000

Reexamination Certificate

active

11020574

ABSTRACT:
Light modulated by a spatial light modulator is projected onto photosensitive material and the photosensitive material is exposed to light in a predetermined pattern. The action of the spatial light modulator is controlled so that the amount of the light projected onto the photosensitive material is changed in at least two stages according to the part of the photosensitive material.

REFERENCES:
patent: 2003/0077089 (2003-04-01), Luellau
patent: 2004/0190030 (2004-09-01), Foster et al.
patent: 2005/0179882 (2005-08-01), Gui et al.
patent: 2005/0206866 (2005-09-01), Ozaki et al.
patent: 2000-206571 (2000-07-01), None
patent: 2002-350897 (2002-12-01), None

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