Exposure method and exposure management system

Details Exposure method and exposure management system Exposure method and exposure management system

2008-07-08

2008-07-08

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S311000, C430S327000, C430S330000

Reexamination Certificate

active

07396620

ABSTRACT:
There is provided an exposure method for exposing a pattern on an original form onto an object through a projection optical system. The exposure method includes the steps of obtaining, for each piece of information of resist applied to a first object, a correlation among an exposure dose for exposing the first object, a focus state of the first object in the projection optical system, and a pattern shape formed on the first object exposed with the exposure dose and the focus state, acquiring information of resist applied to a second object different from the first object, determining an exposure dose for exposing the second object, and a focus state of the second object in the projection optical system, based on the correlation obtained by the obtaining step and the information of the resist applied to the second object acquired by the acquiring step, and transferring the pattern formed on the original form onto the second object in accordance with the exposure dose and focus state determined by the determining step.

REFERENCES:
patent: 6689519 (2004-02-01), Brown et al.
patent: 2001-102282 (2001-04-01), None
patent: 2002-031895 (2002-01-01), None
patent: 2003-168641 (2003-06-01), None
Official Action from the Korean Patent Office issued on May 26, 2006 with translation.

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