Exposure method and exposure device

Details Exposure method and exposure device Exposure method and exposure device

1997-05-14

1999-10-26

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

355 53, 356401, 430 22, G03B 2768, G03B 2742

Patent

active

059737662

ABSTRACT:
An exposure device sequentially transfers a pattern formed in a mask onto connected multiple regions present consecutively on a substrate through a projection optical system. The device includes a substrate stage moving in two dimensions and carrying the substrate in a movement coordinate system determined by a first axis and a mutually perpendicular second axis. A mark detecting sensor detects positions of alignment marks formed on the substrate. A magnification adjustment device corrects the magnification of the projection optical system. At least one calculating device is used to separately calculate extension amounts of the substrate in the direction of the first axis and in the direction of the second axis based on information relating to the positions of the alignment marks detected by the mark detecting sensor. An amount of magnification correction provided by the magnification adjustment device is set based on the extension amounts calculated, and scales of the first and second axes of the movement coordinate system specifying movement of the substrate stage are changed by identical amounts.

REFERENCES:
patent: 4780617 (1988-10-01), Umatate
patent: 4833621 (1989-05-01), Umatate
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5442418 (1995-08-01), Murakami et al.

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