Exposure method and exposure apparatus using it

Radiation imagery chemistry: process – composition – or product th – Including exposure step or specified pre-exposure step...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430394, 430396, 355132, H01L 21027, G03F 720

Patent

active

061070130

ABSTRACT:
An exposure method includes the phase-shifting mask supply step, the phase-shifting mask being prepared by selectively forming a light-shielding portion and a phase shifter on a substrate, and the resist exposure step of performing both exposure of a resist by dark field illumination light and exposure of the resist by bright field illumination light by using the phase-shifting mask, thereby removing residual resist generated by the influence of the edge of the phase shifter.

REFERENCES:
patent: 5440426 (1995-08-01), Sandstrom
patent: 5473409 (1995-12-01), Takeda et al.
patent: 5538833 (1996-07-01), Ferguson et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure method and exposure apparatus using it does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method and exposure apparatus using it, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method and exposure apparatus using it will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-578878

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.