Radiation imagery chemistry: process – composition – or product th – Including exposure step or specified pre-exposure step...
Patent
1997-12-12
2000-08-22
Gibson, Sharon
Radiation imagery chemistry: process, composition, or product th
Including exposure step or specified pre-exposure step...
430394, 430396, 355132, H01L 21027, G03F 720
Patent
active
061070130
ABSTRACT:
An exposure method includes the phase-shifting mask supply step, the phase-shifting mask being prepared by selectively forming a light-shielding portion and a phase shifter on a substrate, and the resist exposure step of performing both exposure of a resist by dark field illumination light and exposure of the resist by bright field illumination light by using the phase-shifting mask, thereby removing residual resist generated by the influence of the edge of the phase shifter.
REFERENCES:
patent: 5440426 (1995-08-01), Sandstrom
patent: 5473409 (1995-12-01), Takeda et al.
patent: 5538833 (1996-07-01), Ferguson et al.
Fujisawa Tadahito
Inoue Soichi
Mimotogi Akiko
Mimotogi Shoji
Tanaka Satoshi
Gibson Sharon
Holloman Jill N.
Kabushiki Kaisha Toshiba
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