Exposure method and apparatus for controlling light pulse emissi

Details Exposure method and apparatus for controlling light pulse emissi Exposure method and apparatus for controlling light pulse emissi

1991-10-04

1993-10-05

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

250548, 355 68, G01J 132

Patent

active

052507971

ABSTRACT:
A semiconductor device manufacturing exposure method usable with a pulsed light source is disclosed. The light source is caused to produce pulses of light in accordance with successively changed control parameters, while a sensor detects each pulse of light from the light source. Outputs of the sensor corresponding to the pulses of light are integrated to determine a quantity of exposure of a predetermined zone of a substrate corresponding to each light pulse. By using the determined exposure quantities corresponding to the pulses of light, a relational equation representing the relationship between each control parameter and a corresponding exposure quantity is determined. Then, a control parameter for subsequent light pulse emission of the light source is determined in accordance with the determined relational equation.

REFERENCES:
patent: 4785192 (1988-11-01), Bruning
patent: 5028797 (1991-07-01), Abe et al.
patent: 5053614 (1991-10-01), Yui et al.
patent: 5134273 (1992-07-01), Wani et al.

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