Exposure method and apparatus and device produced thereby in whi

Photocopying – Projection printing and copying cameras – Step and repeat

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355 71, G03B 2742

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active

056615477

ABSTRACT:
An exposure apparatus includes a supplying device for supplying a band-narrowed laser beam, an optical system for directing the laser beam to a substrate, a detecting device for detecting a change in bandwidth of the laser beam and a stop provided on a path of the laser beam, the stop including an opening having a size which is variable to substantially compensate for the change in bandwidth of the laser beam. Also, a device is manufactured by a method of exposing a photosensitive layer of a substrate through an optical system with a band-narrowed laser beam to print a circuit pattern on the photosensitive layer, in which a bandwidth of the laser beam is substantially compensated for, upon detecting a change in bandwidth of the laser beam, by adjusting a size of an opening of a stop provided in a path of the laser beam.

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patent: 4811055 (1989-03-01), Hirose
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patent: 4905041 (1990-02-01), Aketagawa
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patent: 4968868 (1990-11-01), Aketagawa
patent: 4974919 (1990-12-01), Muraki et al.
patent: 5089913 (1992-02-01), Singh et al.
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patent: 5386269 (1995-01-01), Kosugi

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