Exposure method and apparatus, and device manufacturing method

Details Exposure method and apparatus, and device manufacturing method Exposure method and apparatus, and device manufacturing method

2007-04-03

2009-12-15

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07633597

ABSTRACT:
An exposure apparatus includes an illumination optical system configured to illuminate a reticle using extreme ultraviolet light, a projection optical system configured to project a pattern of the reticle onto a substrate, a diaphragm that defines a first space that accommodates the projection optical system, a first gas supplier configured to supply a first gas to the first space, and a first cooling unit configured to cool the first gas before the first gas supplier supplies the first gas to the first space.

REFERENCES:
patent: 4690528 (1987-09-01), Tanimoto et al.
patent: 4704348 (1987-11-01), Koizumi et al.
patent: 6198792 (2001-03-01), Kanouff et al.
patent: 6714277 (2004-03-01), Hara et al.
patent: 6842221 (2005-01-01), Shiraishi
patent: 6864953 (2005-03-01), Uzawa
patent: 7317505 (2008-01-01), Aichi et al.
patent: 7330236 (2008-02-01), Hasegawa
patent: 2002-529927 (2002-09-01), None
patent: 2005-101537 (2005-04-01), None
patent: 2006/012462 (2006-02-01), None

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