Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1989-08-31

1991-04-16

Hix, L. T.

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

355 55, 355 53, G03B 2768, G03B 2742

Patent

active

050087029

ABSTRACT:
An enlargement projection type exposure method includes the steps of deforming the shape of a substrate so as to eliminate distortion in an enlarged image of the pattern, which is formed on a mask and projected onto the substrate through an enlargement projection system. The pattern is exposed with the use of an enlargement projection optical system. An apparatus for the method comprises an enlargement projection optical system for enlarging the pattern formed on the mask, and a substrate deforming device for deforming by adsorption the substrate in shape so as to eliminate the distortion in the enlarged image of the pattern through the enlargement projection optical system.

REFERENCES:
patent: 4391511 (1983-07-01), Akiyama et al.
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4504045 (1985-03-01), Kenbo et al.
patent: 4666291 (1987-05-01), Taniguchi et al.
patent: 4737824 (1988-04-01), Sakai et al.
patent: 4788577 (1988-11-01), Akiyama et al.

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