Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

2007-05-22

2007-05-22

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S055000, C355S077000

Reexamination Certificate

active

11365045

ABSTRACT:
An exposure method for an exposure apparatus that exposes a mask pattern onto a plate using a projection optical system includes the steps of obtaining information about flatness of a first mask, condition of an image plane when projecting a pattern of the first mask by using the projection optical system, information about a driving amount of a driving system, which can change an imaging condition on the plate based on the condition of the image plane, and information about flatness of a second mask, changing information about the driving amount by using information about flatness of the first and second masks, and driving the driving system based on changed information about the driving amount of the driving system to project a pattern of the second mask onto the plate using the projection optical system.

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