Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

2006-08-22

2006-08-22

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

C355S053000, C355S067000, C355S077000, C430S030000

Reexamination Certificate

active

07095481

ABSTRACT:
An exposure method for projecting, through a projection optical system, a predetermined pattern formed on a mask onto an object to be exposed. The exposure method includes the steps of dividing an effective light source area for illuminating the mask into plural point light sources, calculating a Zernike sensitivity coefficient that represents a sensitivity of a change of image quality of the predetermined pattern to a change of a Zernike coefficient, when wave front aberration in the projection optical system is developed into a Zernike polynomial for all divided point light sources, determining an effective light source distribution based on a combination of Zernike sensitivity coefficient of all divided point light sources, and forming the effective light source distribution by intensity of each point light source.

REFERENCES:
patent: 5760879 (1998-06-01), Shinonaga et al.
patent: 6563573 (2003-05-01), Morohoshi et al.
patent: 6787789 (2004-09-01), Van Der Laan
patent: 6809797 (2004-10-01), Baselmans et al.
patent: 2002/0159040 (2002-10-01), Hamatani et al.
patent: 2003/0091913 (2003-05-01), Shiode
patent: WO 00/31592 (2000-06-01), None

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