Exposure method and apparatus

Photocopying – Projection printing and copying cameras – Focus or magnification control

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000

Reexamination Certificate

active

07106419

ABSTRACT:
An exposure method for exposing a pattern on a reticle onto plural shots on an object, includes the steps of measuring flatness information of each of the plural shots on the object, identifying a shot as a specific shot among the plural shots, the specific shot having flatness that is measured in the measuring step and outside a predetermined range, obtaining positional information by measuring plural measurement points on the object, the obtaining step obtaining more detailed positional information of the specific shot identified by the identifying step than that of a non-specific shot that is not the specific shot, and controlling at least one of a position and a tilt of the object using the positional information obtained by the obtaining step.

REFERENCES:
patent: 4849901 (1989-07-01), Shimizu
patent: 5365051 (1994-11-01), Suzuki et al.
patent: 5448332 (1995-09-01), Sakakibara et al.
patent: 5525808 (1996-06-01), Irie et al.
patent: 5750294 (1998-05-01), Hasegawa et al.
patent: 5998801 (1999-12-01), Imai
patent: 6426508 (2002-07-01), Kosugi et al.
patent: 6538721 (2003-03-01), Okita et al.
patent: 6975384 (2005-12-01), Ina
patent: 6-283403 (1994-10-01), None
patent: 06-260391 (1994-11-01), None
patent: 9-045609 (1997-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method and apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3582378

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.