Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

2006-01-10

2006-01-10

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000, C430S030000, C216S067000

Reexamination Certificate

active

06984472

ABSTRACT:
An unwanted deposited film is removed from the surface of a photomask in which a desired pattern has been formed. Then, a resist film is exposed to extreme ultraviolet radiation through the photomask, from which the deposited film has been removed, thereby transferring the desired pattern onto the resist film.

REFERENCES:
patent: 5466942 (1995-11-01), Sakai et al.
patent: 5582939 (1996-12-01), Pierrat
patent: 5698113 (1997-12-01), Baker et al.
patent: 5928817 (1999-07-01), Yan et al.
patent: 6031598 (2000-02-01), Tichenor et al.
patent: 6279249 (2001-08-01), Dao et al.
patent: 6394109 (2002-05-01), Somekh
patent: 6449332 (2002-09-01), Chiba
patent: 02-042713 (1990-02-01), None
patent: 06-151281 (1994-05-01), None
patent: 11-224839 (1999-08-01), None
patent: 2000-286187 (2000-10-01), None
Notice of Reasons of Rejection dated Mar. 23, 2004.

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