Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1997-11-12

2000-12-19

Rutledge, D.

Photocopying

Projection printing and copying cameras

Step and repeat

355 535, 356401, G03B 2732

Patent

active

061633666

ABSTRACT:
In the exposure method and apparatus, the distortion data of the projection lens in each exposure unit itself has already been known for each exposure unit. Accordingly, when the exposure unit which formed the alignment target layer has already been known, the known data of this exposure unit is used to correct at least one of the projection magnification and shot rotation determined according to multipoint EGA operation, and the exposure apparatus is adjusted by the amount of this correction. When the exposure unit forming the alignment target layer is unknown, the alignment mark exposure unit is specified from the state of distribution of non-linear error computed from the alignment mark measured values within a shot. Under thus determined correct projection magnification and shot rotation, a shot area is accurately overlaid with and exposed to a reticle pattern.

REFERENCES:
patent: 4734746 (1988-03-01), Ushida et al.
patent: 4769523 (1988-09-01), Tanimoto et al.
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4943733 (1990-07-01), Mori et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5402224 (1995-03-01), Hirukawa et al.
patent: 5448333 (1995-09-01), Iwamoto et al.

Affiliated with

Also associated with

Rating

Exposure method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-275219