Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1991-07-03

1992-05-19

Haroian, Harry N.

Optics: image projectors

Lens support

Lens position adjustable

355 53, 353122, G03B 2742

Patent

active

051142236

ABSTRACT:
An exposure method and apparatus in which a first member such as a reticle is illuminated with a light from a light source such as an excimer laser so that the image of a pattern carried by the first member is projected through a projecting optical system onto a second member such as a semiconductor wafer, thereby exposing the second member to the pattern. At least one of the first and the second members and the projecting optical system is adjusted along the optical axis of the projecting optical system and the focus condition of the pattern image on the second member is detected by a focus detecting device during the movement of the member. The exposure is effected in accordance with the output signal from the focus detecting device without requiring the movement of the member to be stopped.

REFERENCES:
patent: Re31219 (1983-04-01), Shenk
patent: 3794421 (1974-02-01), Kano et al.
patent: 4153371 (1979-05-01), Koizumi
patent: 4269505 (1981-05-01), Mayer
patent: 4284336 (1981-08-01), Iwata
patent: 4395117 (1983-07-01), Suzuki
patent: 4420233 (1983-12-01), Nomoto
patent: 4506977 (1985-03-01), Sato et al.
patent: 4600282 (1986-07-01), Yamamura
patent: 4615614 (1986-10-01), Sugiyama
patent: 4648708 (1987-03-01), Kosugi

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