Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1995-05-25

1996-03-12

Gellner, Michael L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 71, 430 5, G03B 2742, G03B 2752

Patent

active

054990769

ABSTRACT:
Disclosed is an exposure method and apparatus for exposing a substrate by use of a pattern having a phase shift device, wherein the amount of phase shift with the phase shift device can be changed by changing the humidity of an ambient gas of the pattern.

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Levenson, et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask," IEEE Transactions on Electron Devices, vol. ED-29, No. 12, Dec. 1982, pp. 1828 through 1836.

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