Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1991-06-18

1992-06-09

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 71, 355 77, G03B 2742, G03B 2772, G03B 2732

Patent

active

051211602

ABSTRACT:
An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any change in the size of the laser beam; and a device for directing the laser beam to a substrate to be exposed, the directing device including a compensator responsive to an output signal from the detector for substantially correcting the change in the beam size.

REFERENCES:
patent: 4498742 (1985-02-01), Uehara
patent: 4688932 (1987-08-01), Suzuki
patent: 4739373 (1988-04-01), Nishi et al.
patent: 4773750 (1988-09-01), Bruning
patent: 4779943 (1988-10-01), Tatsuno et al.
patent: 4780747 (1988-10-01), Suzuki et al.
patent: 4811055 (1989-03-01), Hirose
patent: 4851882 (1989-07-01), Takahashi et al.
patent: 4891663 (1990-01-01), Hirose
patent: 4936665 (1990-06-01), Whitney
patent: 4937619 (1990-06-01), Fukuda et al.
patent: 4954717 (1990-09-01), Sakamoto et al.
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 4977426 (1990-12-01), Hirose
patent: 4988188 (1991-01-01), Ohta

Affiliated with

Also associated with

Rating

Exposure method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1808076