Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1995-04-27

1997-01-28

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430327, 430945, 353121, G03F 720

Patent

active

055976700

ABSTRACT:
A method of exposing a photosensitive substrate with a band-narrowed laser beam from an excimer laser includes providing a stop having an opening in a path of the laser beam; adjusting a size of the opening of the stop to substantially compensate for a change in bandwidth of the laser beam; and exposing after the adjustment the substrate with the laser beam.

REFERENCES:
patent: 4711568 (1987-12-01), Torigoe et al.
patent: 4773750 (1988-09-01), Bruning
patent: 4811055 (1989-03-01), Hirose
patent: 4905041 (1990-02-01), Aketagawa
patent: 4968868 (1990-11-01), Aketagawa
patent: 4974919 (1990-12-01), Muraki
patent: 5089913 (1992-02-01), Singh

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