Exposure method

Details Exposure method Exposure method

1994-10-05

1995-08-15

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 52, G03B 2742

Patent

active

054424186

ABSTRACT:
Prior to exposures, the imaging characteristics of a projection optical system to be used are determined by measuring the positions of plural projection points (evaluation points) within the projection area, on a photosensitive substrate, of the projection optical system. Then the positional aberrations between the evaluation points are determined in the area of image superposition or jointing, and correcting parameters are determined so as to minimize at least the component of the aberrations in a direction, perpendicular to an extending direction patterns of a reticle. The reticle or the photosensitive substrate is rotated or shifted according to thus determined correcting parameters. This exposure method achieves the superposition or jointing of patterns, or the superposition of the jointed parts thereof, in optimum manner, according to the structure (directionality) of the patterns or the imaging characteristics of the projection optical system employed.

REFERENCES:
patent: 4734746 (1988-03-01), Ushida et al.
patent: 4980718 (1990-12-01), Salter et al.
patent: 5008702 (1991-04-01), Tanaka et al.

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