Exposure method

Details Exposure method Exposure method

1994-09-30

1995-05-23

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Methods

355 43, 355 53, G03B 2732, G03B 2752, G03B 2770, G03B 2742

Patent

active

054185998

ABSTRACT:
An exposure apparatus includes a first reflective type photomask 18a, a first mask stage 100a for mounting the first reflected type photomask 18a, a second reflective type photomask 18b, and a second mask stage 180b for mounting the second reflective type photomask 18b. Light 11a from a light source 11 is directed to the first and second reflective type photomasks 18a and 18b. The first exposure light 110c and the second exposure light 110b reflected by the first and second reflective type photomasks 18a and 18b are merged by a half mirror 30 to form a third exposure light 110e to expose a resist film 21a on a semiconductor substrate 21.

REFERENCES:
patent: 4295735 (1981-10-01), Lacombat et al.
patent: 4422753 (1983-12-01), Pryor
patent: 4769680 (1988-09-01), Resor, III et al.
patent: 4860061 (1989-08-01), Ikeda
patent: 4869998 (1989-09-01), Eccles et al.
patent: 4878086 (1989-10-01), Isohata et al.
patent: 5117254 (1992-05-01), Kawashima et al.
patent: 5191465 (1993-03-01), Yamashita et al.
patent: 5272685 (1993-12-01), Ando
patent: 5289312 (1994-02-01), Hashimoto et al.
patent: 5363170 (1994-11-01), Muraki
patent: 5369464 (1994-11-01), Kamon

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