Exposure method

Details Exposure method Exposure method

1995-10-06

1998-06-02

Jordan, Charles T.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

G03F 900

Patent

active

H00017337

ABSTRACT:
An exposure method for transferring a pattern on a mask onto a photosensitive substrate. The exposure method has steps of (1) preparing the mask with a first alignment mark and the substrate with a second alignment mark, a length of the first alignment mark in a scan direction being shorter than a length of the second alignment mark in the same direction; (2) scanning the first and second alignment marks; (3) detecting an intensity of the light which has been emitted from the light source optical system and irradiated the mask and the substrate; (4) calculating an amount of dislocation between the first and second alignment marks in the scan direction; (5) correcting the dislocation between the mask and the substrate; (6) effecting an exposure to transfer the pattern on the mask onto the substrate.

REFERENCES:
patent: 4371264 (1983-02-01), Lacombat et al.
patent: 4815854 (1989-03-01), Tanaka et al.
patent: 4853745 (1989-08-01), Kamiya et al.
patent: 4880310 (1989-11-01), Nishi
patent: 4984890 (1991-01-01), Tojo et al.
patent: 5155557 (1992-10-01), Iwazawa et al.
patent: 5189494 (1993-02-01), Muraki
patent: 5214493 (1993-05-01), Sugiyama et al.
patent: 5231467 (1993-07-01), Takeuchi et al.

Affiliated with

Also associated with

Rating

Exposure method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1447364