Exposure method

Details Exposure method Exposure method

1985-04-30

1986-08-05

Kittle, John

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

430967, G03C 500

Patent

active

046043454

ABSTRACT:
An exposure method for exposing a sensitive layer on a semiconductor wafer to an integrated-circuit pattern of a mask. The exposure is effected by a combination of a primary exposure step for exposing the sensitive layer to the pattern with a beam of high resolution and a secondary exposure step for exposing the sensitive layer with a beam of lower resolution and by an amount which does not have a substantial effect on the sensitization of the sensitive layer. By the combined exposures, the exposure time can be reduced as compared with that required in the exposure only through a high-resolution exposure.

REFERENCES:
patent: 3697272 (1972-10-01), Ramins
patent: 3888672 (1975-06-01), Lee
patent: 4256829 (1981-03-01), Daniel
patent: 4301237 (1981-11-01), Burns
patent: 4324850 (1982-04-01), Tomita et al.
patent: 4394437 (1983-07-01), Bergendahl et al.
patent: 4453262 (1984-06-01), Buckley
patent: 4454209 (1984-06-01), Blais

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