Exposure method

Details Exposure method Exposure method

2006-02-24

2009-10-13

Duda, Kathleen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

C430S311000, C430S396000

Reexamination Certificate

active

07601485

ABSTRACT:
An exposure method for exposing a resist film disposed on one surface of a wafer includes a first exposure step of locating an exposure mask at a first predetermined position with respect to the wafer, and exposing the resist film. The exposure method further includes a second exposure step of displacing the exposure mask relative to the wafer by a predetermined dimension in a predetermined direction to locate the exposure mask at a second predetermined position, and exposing the resist film.

REFERENCES:
patent: 6395456 (2002-05-01), Tamada et al.
patent: 2003/0096200 (2003-05-01), Liao
patent: 2004/0219443 (2004-11-01), Spears

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