Exposure method

Details Exposure method Exposure method

2006-12-06

2009-11-17

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000, C430S311000

Reexamination Certificate

active

07619716

ABSTRACT:
An exposure method includes the steps of exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate, and by illuminating an illumination area having a slit shape on the reticle using a light from a light source, the slit shape having a longitudinal direction corresponding to a direction orthogonal to a scanning direction, and correcting an accumulated illuminance in the scanning direction at each position of the illumination area in the longitudinal direction, wherein the correcting step includes the steps of calculating a first illuminance correction amount common to plural areas on the substrate, the pattern being to be transferred to each area, and calculating a second illuminance correction amount intrinsic to each area, the correcting step correcting the accumulated illuminance based on the first and second illuminance correction amounts.

REFERENCES:
patent: 6768546 (2004-07-01), Sato
patent: 2003/0025890 (2003-02-01), Nishinaga
patent: H09-190969 (1997-07-01), None
Jan van Schoot et al., CD Uniformity Improvement by Active Scanner Corrections, Proceedings of SPIE, 2002, pp. 304-314, vol. 4691, SPIE.

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