Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Reexamination Certificate
2006-01-31
2006-01-31
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Plural exposure steps
C430S005000, C250S492220, C355S067000
Reexamination Certificate
active
06991896
ABSTRACT:
An exposure method includes the steps of providing a mask that arranges a contact-hole pattern and a pattern smaller than the contact-hole pattern, and illuminating the mask using plural kinds of light so as to resolve the contact-hole pattern and restrain the smaller pattern from resolving on an object to be exposed via a projection optical system, wherein the following conditions are met A=−1.7k1+C1, 1.2≦C1≦1.3, 0.5≦B≦0.55 and B≦A−0.1, 0.80≦σ≦0.9 and σ≧A+0.1, k1=(L/λ)NA, where k1is resolving power, L is a hole diameter of the contact-hole pattern, λ is a wavelength for exposure, NA is a numerical aperture of the projection optical system, σ is a ratio of a numerical aperture of an illumination optical system to the numerical aperture of the projection optical system, A and B are distances from two orthogonal axes to a boarder of a light-shielding part in an effective light source for illumination of plural kinds of light, the light-shielding part being symmetrical with respect to the two orthogonal axes.
REFERENCES:
patent: 6150059 (2000-11-01), Tanabe et al.
patent: 2002/0045134 (2002-04-01), Inoue et al.
patent: 2002/0177048 (2002-11-01), Saitoh et al.
patent: 2003/0198872 (2003-10-01), Yamazoe et al.
patent: 3119217 (2000-10-01), None
patent: 2002/122976 (2002-04-01), None
patent: 02/088843 (2002-11-01), None
Chacko-Davis Daborah
McPherson John A.
Morgan & Finnegan , LLP
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