Exposure meter for photomicrography

Details Exposure meter for photomicrography Exposure meter for photomicrography

1978-04-11

1979-11-13

Griffin, Donald A.

350 19, 354 79, G02B 2100, G03B 1748, G03B 708

Patent

active

041741595

ABSTRACT:
Photomicrographic exposure meter for cameras attached to microscopes in which part of the picture-taking beam is reflected by means of a beam-splitter and where the reflected beam part projects an image of the object onto an image plane, measuring field stop is located in the image plane with an aperture for detail or spot measurements and an insertable photo-electric detector cooperates therewith downstream of the stop in the direction of light.
The beam part is reflected by at least one specular means (12,61) to the measuring field stop (13). The stop is gimbal-suspended and means are provided both for displacing the gimbal-suspended specular means (12,61) and for viewing the object detail appearing in the stop aperture.

REFERENCES:
patent: 3106129 (1963-10-01), Frenk et al.
patent: 3130634 (1964-04-01), Kropp et al.
patent: 3851949 (1974-12-01), Kraft et al.

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