Exposure mechanism

Details Exposure mechanism Exposure mechanism

1992-02-13

1992-12-08

Ben, Loha

Optical: systems and elements

Optical aperture or tube, or transparent closure

359799, 2504922, 356401, G02B 500

Patent

active

051702932

ABSTRACT:
An exposure mechanism having a hole pattern for forming a resist pattern to be used in a photolithography process when a semiconductor device is fabricated, the hole pattern including a central light transmitting portion provided on a transparent substrate, through which exposed light can pass, a plurality of slit-shaped light transmitting portions provided around the central light transmitting portion, and a light intercepting portion provided on the transparent substrate for forming the central light transmitting portion and the slit-shaped light transmitting portions.

REFERENCES:
patent: 2660923 (1953-12-01), Benford
patent: 3193687 (1965-07-01), Hatcher
patent: 3856418 (1974-12-01), Levine
patent: 4578587 (1986-03-01), Behringer et al.
patent: 4694178 (1987-09-01), Harte
patent: 4794426 (1988-12-01), Nishi
patent: 4798470 (1989-01-01), Moriyama et al.
SPIE vol. 1261 Integrated Circuit Metrology, Inspection and Process Control IV (1990), pp. 315-324.

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