Exposure mask, method of producing the same, exposure mask produ

Details Exposure mask, method of producing the same, exposure mask produ Exposure mask, method of producing the same, exposure mask produ

1996-04-08

1998-07-07

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, G03F 900

Patent

active

057766398

ABSTRACT:
A two-dimensional shape of a dotted pattern and optical densities of dots or sizes of dots having the same optical density are calculated as write data on the basis of a target distribution of transmittance. The dotted pattern is optically written on a photosensitive medium in accordance with the calculated write data, using a beam from a light source whose output is stepwise or sequentially variable. A latent dotted pattern on the photosensitive medium is developed, thereby obtaining an exposure mask having a desired two-dimensional distribution of transmittance expressed by the dotted pattern and the optical densities of dots or the sizes of dots having the same optical density.

REFERENCES:
patent: 5369282 (1994-11-01), Arai et al.

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