Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1990-01-18
1993-08-10
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430290, 430313, 430321, 2504922, 2504921, 378 35, G03F 900
Patent
active
052347800
ABSTRACT:
An exposure mask for lithography, a method of manufacturing the same, and an exposure method using the same are disclosed. A light-transmitting opening of the exposure mask has a main light-transmitting region located in the middle of the opening and having a first optical path length, and phase shift regions adjacent to a light-shielding layer and having a second optical path length, different from the first optical path length. Light transmitted through each phase shift region interferes with light transmitted through the main light-transmitting region at the edges of the light-transmitting opening, thus enabling a sharp photo-intensity distribution of total transmitted light to be obtained. As a result, the resolution of the exposure mask is improved.
REFERENCES:
patent: 4026743 (1977-05-01), Berezin et al.
patent: 4890309 (1989-12-01), Smith et al.
patent: 5045417 (1991-09-01), Okamoto
Levenson, M. D. et al, "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Device, vol. ED-29, No. 12, Dec. 1982, pp. 1828-1836.
Hashimoto Kouji
Nakase Makoto
Nitayama Akihiro
Wada Hirotsugu
Bowers Jr. Charles L.
Kabushiki Kaisha Toshiba
Neville Thomas R.
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