Exposure mask, method of fabricating same, and method of manufac

Details Exposure mask, method of fabricating same, and method of manufac Exposure mask, method of fabricating same, and method of manufac

1997-06-26

1999-03-30

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058886770

ABSTRACT:
An exposure mask has a predetermined principal pattern formed on a principal surface of a mask substrate and including a continuous pattern of lines which are repeatedly arranged at a first interval and an isolated pattern which is arranged adjacent to a line of the continuous pattern at a second interval greater than the first interval; and an auxiliary pattern formed along a direction in which the predetermined principal pattern is arranged, adapted to overcome multiple-beam-flux interference of diffracted light on a pupil's plane by providing the isolated pattern with cyclicity, and having a line width which falls outside a limit of resolution on a plane of projection of exposing light. Also disclosed are a method of fabricating the mask, and a method of manufacturing semiconductor devices using the mask.

REFERENCES:
patent: 5342713 (1994-08-01), Ohtsuka et al.
patent: 5429897 (1995-07-01), Yoshioka et al.

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