Exposure mask, manufacturing method of electronic device,...

Details Exposure mask, manufacturing method of electronic device,... Exposure mask, manufacturing method of electronic device,...

2007-10-18

2010-12-21

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000, C430S311000, C257S797000

Reexamination Certificate

active

07855035

ABSTRACT:
According to the present invention, provided is a method of manufacturing a electronic device including forming a film over a substrate, performing a photoresist over the film, performing a first exposure by using an exposure mask which includes a scribe region and a inspection mark formed in a first side of the scribe region, and performing a second exposure so that a region that is exposed to the first side in the first exposure is exposed to a second side of the scribe region which is opposite to the first side, wherein, in the second exposure, an exposure light is incident on a region where the inspection mark is projected in the first exposure.

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patent: 2006/0222962 (2006-10-01), Chen et al.
patent: 3-18012 (1991-01-01), None
patent: 5-341499 (1993-12-01), None

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