Exposure mask for divided exposure

Details Exposure mask for divided exposure Exposure mask for divided exposure

2011-06-21

2011-06-21

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07964326

ABSTRACT:
A divided exposure method for a photolithography process is disclosed, which uses a mask. The mask for an exposer having a left and right light intensity deviation includes a substrate; a first pattern in a middle of the substrate; and second and third patterns on left and right sides of the first pattern, respectively, wherein the first and second patterns compensate for the left and right light intensity deviation of the exposer.

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patent: 10-0392054 (2003-03-01), None

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