Exposure mask, exposure mask substrate, method for fabricating t

Details Exposure mask, exposure mask substrate, method for fabricating t Exposure mask, exposure mask substrate, method for fabricating t

1993-04-21

1996-08-20

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430312, 430322, G03F 900

Patent

active

055477879

ABSTRACT:
An exposure mask having an excellent alignment accuracy between patterns, which is prepared by first forming on a light transmissive substrate a light shielding film or a semi-transparent film pattern (first pattern) somewhat larger than a desired dimension, forming thereon a semi-transparent film or a light transmissive film pattern (second pattern) so as to include all patterns of the desired dimensions made up of a light shielding part, a semi-transparent part and a light transmissive part, and then removing a projected part of the first pattern with use of the second pattern as a mask.
The semi-transparent film is formed of at least two layers each of which contains a common element, thus the semi-transparent film can be made with use of the same apparatus and when patterning, etching process can be carried out with use of the same etchant.
Further, since in a mask including the semi-transparent pattern, at least that area of non-pattern zone where light reaches a wafer through the transfer, acts to shield the exposure light, too narrowed pattern or insufficient focal depth can be prevented.

REFERENCES:
patent: 4890309 (1989-12-01), Smith et al.
patent: 4902899 (1990-02-01), Lin et al.
patent: 5286581 (1994-02-01), Lee

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