Exposure mask contamination inspect method and system therefor

Details Exposure mask contamination inspect method and system therefor Exposure mask contamination inspect method and system therefor

1997-09-04

1999-04-27

Le, Que T.

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

250548, G01N 2186

Patent

active

058981829

ABSTRACT:
The present invention provides a method for inspecting only a contamination which there is a possibility to have an actual influence during exposure on a mask. In this method, a mask comprises at least two areas, each of which has a shade pattern, a first inspection light is introduced to the one face of a first area, a second inspection light to another face of a second area. An image transmitting through the first area and an image reflected by the second area are received and composed to obtain a first composite image. Then, an image reflected by the first area and an image transmitting through the second area are received and composed to obtain a second composite image. Thereafter, a contamination on the mask is indicated based on the first composite image and the second composite image.

REFERENCES:
patent: 5710624 (1998-01-01), Utamura

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