Exposure mask comprising translucent and transparent phase shift

Details Exposure mask comprising translucent and transparent phase shift Exposure mask comprising translucent and transparent phase shift

1993-07-15

1995-04-25

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, G03F 900

Patent

active

054097894

ABSTRACT:
This invention provides an exposure mask having mask patterns formed on a transparent substrate, the mask patterns including translucent phase shift patterns having a light path length for exposure light differentiated by 180.degree. from that of transparent areas of said transparent substrate and transparent phase shift patterns. Such an exposure mask can be advantageously used to realize highly defined patterns.

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