Exposure mask and method of manufacturing thereof, and pattern d

Details Exposure mask and method of manufacturing thereof, and pattern d Exposure mask and method of manufacturing thereof, and pattern d

1997-03-07

2000-12-12

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

216 12, G03F 900

Patent

active

061596426

ABSTRACT:
An exposure mask includes a transparent substrate having a light shielding pattern and an aperture pattern thereon for transmitting an exposure light and arranged in that any two adjacent apertures of the same pattern size in the aperture pattern are different from each other in the etched depth, wherein a difference between the aperture pattern size and its adjacent light shielding pattern size, and the trench depth in the aperture pattern are determined by a sum of the aperture pattern size and its adjacent light shielding pattern size.

REFERENCES:
patent: 5348826 (1994-09-01), Dao et al.
patent: 5465859 (1995-11-01), Chapple-Sokol et al.
patent: 5549995 (1996-08-01), Tanaka et al.

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