Exposure mask and method of manufacturing the same, and...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S311000

Reexamination Certificate

active

07659040

ABSTRACT:
An exposure mask24, includes a quartz (transparent) substrate20, a film21formed on the quartz substrate20, a rectangular main feature21aformed in the film21, a first assist feature21bformed in the film21away from the main feature21aand having a size that is not resolved as a rectangle that has a long side21eopposing to one side21dof the main feature21d, and a second assist feature21cformed in the film21and positioned on a virtual prolonged line L of a diagonal of the main feature21aand having a size that is not resolved.

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“Japanese Office Action”, Partial English-language translation, mailed Mar. 31, 2009 from JP Patent Office for corresponding JP App. No. 2005-159077.

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