Exposure mask and method for manufacturing semiconductor...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S311000

Reexamination Certificate

active

08080349

ABSTRACT:
A method for manufacturing a semiconductor device comprises performing an exposing and developing process using an exposure mask including shading patterns and assistant patterns arranged in parallel to the shading patterns to prevent a scum phenomenon generated when a main pattern is formed in a cell region over a semiconductor substrate, thereby improving characteristics, reliability and yield of the semiconductor device. As a result, the method enables high-integration of the semiconductor device.

REFERENCES:
patent: 5965302 (1999-10-01), Horikawa et al.
patent: 2002/0006734 (2002-01-01), Imai et al.
patent: 2004/0023132 (2004-02-01), Akiyama
patent: 2008/0239272 (2008-10-01), Wang et al.
patent: 06-313964 (1994-11-01), None
patent: 1020000054949 (2000-09-01), None
patent: 1020060020300 (2006-03-01), None
patent: 1020060052324 (2006-05-01), None

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