Exposure mask and method for fabricating thin-film transistor

Details Exposure mask and method for fabricating thin-film transistor Exposure mask and method for fabricating thin-film transistor

2008-09-08

2010-12-28

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

07858272

ABSTRACT:
An exposure mask includes a transparent substrate; a first pattern portion formed on the transparent substrate using at least one light-shielding pattern having a predetermined shape; and a translucent layer which is formed at a section including a first pattern region having the first pattern portion, which allows exposure light to pass therethrough, and which has a transmittance greater than that of the light-shielding pattern.

REFERENCES:
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patent: 2006/0099521 (2006-05-01), Park et al.
patent: 2007/0037070 (2007-02-01), Ohnuma et al.
patent: 2009/0127596 (2009-05-01), Sera et al.
patent: A 08-250446 (1996-09-01), None
patent: A 2002-151523 (2002-05-01), None
patent: A 2006-054424 (2006-02-01), None
patent: A 2007-072452 (2007-03-01), None
patent: A 2007-103418 (2007-04-01), None

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