Exposure mask and manufacturing method thereof

Details Exposure mask and manufacturing method thereof Exposure mask and manufacturing method thereof

1996-09-17

1999-02-02

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430323, G03F 900

Patent

active

058662804

ABSTRACT:
An exposure mask comprises a phase shift section including a plurality of opening patterns formed by making openings in part of a shading film provided on a transmissive substrate and digging part of the substrate, and a non-phase shift section including at least one opening pattern. The opening pattern of the non-phase shift section has a dig whose amount of digging has been adjusted according to the amount of digging in the opening patterns of the phase shift section.

REFERENCES:
patent: 5225035 (1993-07-01), Rolfson
patent: 5300379 (1994-04-01), Dao et al.
patent: 5348826 (1994-09-01), Dao et al.
patent: 5514498 (1996-05-01), Nakagawa
patent: 5538815 (1996-07-01), Oi et al.
patent: 5549995 (1996-08-01), Tanaka et al.
J. Vac. Sci. Technol. B, vol. 10, No. 6, pp. 3055-3061, Nov/Dec 1992, R. L. Kostelak, et al., "Exposure Characteristics of Alternate Aperture Phase-Shifting Masks Fabricated Using A Subtractive Process".

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