Exposure mask and a method of making a semiconductor device...

Details Exposure mask and a method of making a semiconductor device... Exposure mask and a method of making a semiconductor device...

2008-06-27

2010-10-26

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

07820345

ABSTRACT:
Disclosed herein are an exposure mask and a method of making a semiconductor device using the mask. The exposure mask includes a transparent substrate; and a light blocking pattern having first and second patterns, and an assist feature disposed between the first and second patterns and including a dot pattern arranged into two rows deviated from each other. The exposure make can improve the depth of focus margin to allow for the high integration of a semiconductor device.

REFERENCES:
patent: 2002/0045106 (2002-04-01), Baselmans et al.
patent: 2004/0131950 (2004-07-01), Butt et al.
patent: 2006/0199084 (2006-09-01), Word
patent: 2006/0269848 (2006-11-01), Setta
patent: 2009/0142674 (2009-06-01), Moon
patent: 10-2000-0075841 (2000-12-01), None
patent: 10-2007-0112032 (2007-11-01), None
Notice of Rejection for Korean Patent Application No. 10-2008-0022618, dated Jun. 23, 2009.

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